Field
two·photoncausal lithography lab
Initializing solverRust/Wasm · 4F-RD · seed 07A1
Target / official benchmark meshTARGET

Micro‑Benchy

22.0 × 11.4 × 17.6 µm · CreativeTools 3DBenchy

focus PSF intended path calculated matter
Reaction Lens · 3D volume sectionAuthoritative XY · z 0 µm
initializing
XY
O₂ 100.0%R max 0.00x̄ 0.0%gel 0.0%
Rust/Wasm 3D volume128×72 planevolume tier0 target cellsmemory pending0 solver steps/smemory pendingtotal · replay pending
Process state0.00 sphysical exposure time
target gel 0.0%spill gel 0.0%replay 00000000
Current stageSpecimen ready0%